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尺寸：100*100um 德國(guó)2D Next主要提供機(jī)械剝離的超大尺寸二維材料，可以提供在眾多基底上的轉(zhuǎn)移技術(shù)，如二氧化硅，藍(lán)寶石，CVD金剛石等，可用材料包括MoS2，WS2，WSe2等，提供三種尺寸的機(jī)械剝離單層材料，分別為50um,75um,100um

Monolayer molybdenum disulfide (1H-MoS?) flakes have been exfoliated from bulk molybdenum disulfide (2H-MoS?) onto 90nm thermal oxide and measures from 5 micron up to 40 micron in size.

Monolayer molybdenum diselenide (1H-MoSe?) flakes have been exfoliated from bulk molybdenum diselenide (2H-MoSe?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

Monolayer Rhenium diselenide flakes have been exfoliated from bulk ReSe? crystals onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

Monolayer tungsten disulfide (1H-WS?) flakes have been exfoliated from bulk tungsten disulfide (2H-WS?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

Monolayer tungsten diselenide (1H-WSe?) flakes have been exfoliated from bulk tungsten diselenide (2H-WSe?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.